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SAP process etching SCC-SET

SAP process etching SCC-SET

Introduction to SAP process etching SCC-SET products

Product Features

The etching rate is slow (0.5-1.5μm/min) and stable for easy management

It inhibits the side erosion of the bottom of the line, the etching is uniform, and the size of the graphic and design value changes is small

The roughness of the copper surface increases after etching

The insulation impedance between the graphics is small and the performance is good

Arc rate less than 25%

Process Parameters

Etch rate: 0.5-1.5μm/min

No lateral erosion

Arc rate< 25%

Roughness < 200nm